SAW characteristics of AlN films deposited on various substrates using ECR plasma enhanced CVD and reactive RF sputtering
- Issue Date
- 1996-11-03
- Language
- ENG
- Citation
1996 IEEE Ultrasonics Symposium. Part 2 (of 2), v.1, pp.299 - 302
- ISSN
- 1051-0117
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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