DSpace at KOASAS: DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Theses_Ph.D.(박사논문)

DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO_3$ 박막의 특성 평가에 관한 연구Preparation of $RuO_x$ bottom electrode by DC reactive sputtering and characterization of $(Ba,Sr)TiO_3$ thin films

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안준형 / Ahn, Joon-Hyung

Advisors: 김호기 researcher; Kim, Ho-Gi researcher

Description: 한국과학기술원 : 재료공학과,

Publisher: 한국과학기술원

Issue Date: 1998

Identifier: 143457/325007 / 000945232

Language: kor

Description: 학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ iv, 156 p. ]

Keywords: 하부전극; (Ba,Sr)TiO3; RuOx; DC 반응성 스퍼터링; 누설전류; Leakage current; Bottom electrode; (Ba,Sr)TiO3; RuOx; DC reactive sputtering

URI: http://hdl.handle.net/10203/50219

Link: http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143457&flag=dissertation

Appears in Collection: MS-Theses_Ph.D.(박사논문)

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DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO_3$ 박막의 특성 평가에 관한 연구Preparation of $RuO_x$ bottom electrode by DC reactive sputtering and characterization of $(Ba,Sr)TiO_3$ thin films

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