다결정 실리콘 박막 트랜지스터를 위한 저온 Electron Cyclotron Resonance N2O- 플라즈마 산화Low Temperature Electron Cyclotron Resonance N₂O-Plasma Oxidation for Polysilicon Thin Film Transistors
- Publisher
- 대한전기학회
- Issue Date
- 1998
- Language
- Korean
- Citation
전기학회논문지, v.47, no.9, pp.1458 - 1462
- ISSN
- 1340-5551
- Appears in Collection
- RIMS Journal Papers
- Files in This Item
- There are no files associated with this item.
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