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Título: | Effects of Stress and Morphology on the Resistivity and Critical Temperature of Room-Temperature-Sputtered Mo Thin Films |
Autor: | Fàbrega, Lourdes CSIC ORCID; Fernández-Martínez, Iván CSIC; Parra-Borderías, María CSIC; Gil García, Óscar; Camón, Agustín CSIC ORCID ; González-Arrabal, Raquel CSIC ORCID; Sesé Monclús, Javier CSIC ORCID; Santiso, José CSIC ORCID; Costa Krämer, José Luis CSIC ORCID ; Briones Fernández-Pola, Fernando CSIC | Palabras clave: | Conductivity Sputtering Stress Superconducting films |
Fecha de publicación: | 4-sep-2009 | Editor: | Institute of Electrical and Electronics Engineers | Citación: | IEEE Transactions on Aplied Superconductivity, 19 ( 2009) | Resumen: | We report on the structural and electrical characterization of Mo thin films deposited at room temperature by RF magnetron sputtering. The effect of RF power on the morphology and residual stress of the films is analyzed. The films are under compressive stress and consist of densely packed columns with a lateral size on the order of 20 nm. The stress, critical temperature, and resistivity of the films are found to rise when increasing the ejected ion energy during the sputtering process. The changes in critical temperature and resistivity are discussed in terms of the observed morphology and stress changes. | Versión del editor: | http://dx.doi.org/10.1109/TASC.2009.2027609 | URI: | http://hdl.handle.net/10261/23772 | DOI: | 10.1109/TASC.2009.2027609 | ISSN: | 1051-8223 |
Aparece en las colecciones: | (IMN-CNM) Artículos |
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Fabrega, Lourdes et al IEEE Trans.on appl. supercon._19_2009.pdf | 409,54 kB | Adobe PDF | Visualizar/Abrir |
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