Coercive and anisotropy fields in patterned amorphous FeSi submicrometric structures

Abstract

Amorphous FexSi12x films have been prepared on Si substrates in order to fabricate submicrometric magnetic structures with soft magnetic behavior. The magnetic properties compositional dependence of the unpatterned samples has been analyzed to select the Fe content (x50.7) with the lowest coercive and anisotropy fields values. Arrays of Fe0.7Si0.3 lines have been fabricated by electron beam lithography combined with a liftoff technique, with typical dimensions of 200 nm linewidth and 1 mm line spacing. These arrays present coercive fields parallel to the line direction as small as 9 Oe.