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Fabrication of multimode polymeric waveguides and micromirrors using deep x-ray lithography
Cited 20 time in
Web of Science
Cited 33 time in Scopus
- Authors
- Issue Date
- 2004-03
- Citation
- IEEE Photon. Technol. Lett., vol. 16, pp. 798-800, Mar. 2004
- Keywords
- X-ray lithography ; elastomers ; micromirrors ; optical fabrication ; optical interconnections ; optical losses ; optical polymers ; optical waveguides ; polymeric multimode waveguide
- Abstract
- Multimode polymeric waveguides and 45° micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer, respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllability of mirror angles to 45° and -45° so that it gives flexibility to the system architecture of optical interconnections.
- ISSN
- 1041-1135
- Language
- English
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