Localised probing of precursor coefficients using electron beam induced deposition and etching

Cullen, Jared Craig

Localised probing of precursor coefficients using electron beam induced deposition and etching

Cullen, Jared Craig

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Publication Type:: Thesis
Issue Date:: 2016

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Field	Value	Language
dc.contributor.author	Cullen, Jared Craig
dc.date.accessioned	2016-03-29T23:39:25Z
dc.date.available	2016-03-29T23:39:25Z
dc.date.issued	2016
dc.identifier.uri	http://hdl.handle.net/10453/43421
dc.description	University of Technology Sydney. Faculty of Science.	en_AU
dc.description.abstract	Electron beam induced etching (EBIE) and deposition (EBID) are direct-write deposition techniques in which an electron beam is used for chemical precursor dissociation. Both techniques are capable of nanometer-scale resolution, but applications have been limited by poor understanding of the underlying reaction mechanisms and rate parameters. Here, a hybrid Continuum-Monte Carlo model has been designed and implemented, enabling modelling of the temporal and spatial evolution of nanostructures fabricated by EBID and EBIE. This hybrid model is used to perform Arrhenius analysis of the deposition rates of nanostructures grown by EBID and EBIE, from which both precursor desorption and diffusion rate parameters can be obtained. These parameters are of fundamental interest in physical chemistry and surface science fields but also are key to optimisation of chemical vapour deposition (CVD), EBID, EBIE, and related surface processing and nanofabrication techniques. Methods used to determine the activation energy and pre-factors for desorption and diffusion are described in detail. The limitations of these methods, growth conditions needed to minimise errors, and applications to the chemistry, physics and nanotechnology communities are also discussed.	en_AU
dc.format	Thesis (PhD)
dc.language.iso	en_AU	en_AU
dc.relation	https://opus.lib.uts.edu.au/bitstream/10453/43421/2/02whole.pdf
dc.rights	The author owns the copyright in this thesis including all reproduction and reuse rights for the work. The work may not be altered without the permission of the copyright owner. Attribution is essential when quoting or paraphrasing from this thesis.
dc.rights	au.edu.uts.lib/ppc
dc.rights	info:eu-repo/semantics/openAccess
dc.subject	Electron beam induced etching (EBIE).	en
dc.subject	Electron beam induced deposition (EBID).	en
dc.subject	Precursor coefficients.	en
dc.subject	Hybrid Continuum-Monte Carlo model.	en
dc.subject	Arrhenius analysis.	en
dc.title	Localised probing of precursor coefficients using electron beam induced deposition and etching	en_AU
dc.type	Thesis	en_AU
utslib.copyright.status	open_access

Abstract:

Electron beam induced etching (EBIE) and deposition (EBID) are direct-write deposition techniques in which an electron beam is used for chemical precursor dissociation. Both techniques are capable of nanometer-scale resolution, but applications have been limited by poor understanding of the underlying reaction mechanisms and rate parameters. Here, a hybrid Continuum-Monte Carlo model has been designed and implemented, enabling modelling of the temporal and spatial evolution of nanostructures fabricated by EBID and EBIE. This hybrid model is used to perform Arrhenius analysis of the deposition rates of nanostructures grown by EBID and EBIE, from which both precursor desorption and diffusion rate parameters can be obtained. These parameters are of fundamental interest in physical chemistry and surface science fields but also are key to optimisation of chemical vapour deposition (CVD), EBID, EBIE, and related surface processing and nanofabrication techniques. Methods used to determine the activation energy and pre-factors for desorption and diffusion are described in detail. The limitations of these methods, growth conditions needed to minimise errors, and applications to the chemistry, physics and nanotechnology communities are also discussed.

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http://hdl.handle.net/10453/43421