Počet záznamů: 1
Fabrication of highly stable and low defect density amorphous silicon films at low substrate temperature by plasma chemical vapor deposition assisted with piezoelectric vibration
- 1.0130577 - FZU-D 950162 RIV JP eng J - Článek v odborném periodiku
Sumiya, M. - Kawasaki, M. - Kočka, Jan - Koinuma, H.
Fabrication of highly stable and low defect density amorphous silicon films at low substrate temperature by plasma chemical vapor deposition assisted with piezoelectric vibration.
Japanese Journal of Applied Physics. Roč. 34, - (1995), s. L97-L100. ISSN 0021-4922. E-ISSN 1347-4065
Grant CEP: GA ČR GA202/95/1445
Impakt faktor: 1.100, rok: 1995
Trvalý link: http://hdl.handle.net/11104/0028695
Počet záznamů: 1