Structuring of diamond films using microsphere lithography

0440224 - FZÚ 2015 RIV CZ eng J - Článek v odborném periodiku
Domonkos, Mária - Ižák, Tibor - Štolcová, L. - Proška, J. - Demo, Pavel - Kromka, Alexander
Structuring of diamond films using microsphere lithography.
Acta Polytechnica. Roč. 54, č. 5 (2014), s. 320-324. ISSN 1210-2709. E-ISSN 1805-2363
Grant CEP: GA ČR(CZ) GBP108/12/G108
Institucionální podpora: RVO:68378271
Klíčová slova: nanostructuring * diamond thin films * polystyrene microspheres * reactive ion etching * scanning electron microscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

In this study, the structuring of micro- and nanocrystalline diamond films is demonstrated. The diamond films are structured using the technique of microsphere lithography followed by reactive ion etching. Specifically, this paper presents a four-step fabrication process: diamond deposition (microwave plasma assisted chemical vapor deposition), mask preparation (by the standard Langmuir-Blodgett method), mask modification and diamond etching. A self-assembled monolayer of monodisperse polystyrene (PS) microspheres with close-packed ordering is used as the primary template. Then the PS and the diamond films are processed in CCP plasma using various plasma chemistries. This fabrication method illustrates the preparation of large arrays of periodic and homogeneous hillock-like structures. The surface morphology of the processed diamond films is characterized by scanning electron microscopy and with the use of an atomic force microscope.
Trvalý link: http://hdl.handle.net/11104/0243341