The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

0519372 - FZÚ 2020 RIV CH eng J - Článek v odborném periodiku
Hajihoseini, H. - Čada, Martin - Hubička, Zdeněk - Ünaldi, S. - Raadu, M.A. - Brenning, N. - Gudmundsson, J.T. - Lundin, D.
The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge.
Plasma. Roč. 2, č. 2 (2019), s. 201-221. E-ISSN 2571-6182
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA19-00579S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: ionized physical vapor deposition * magnetron sputtering * high power impulse magnetron sputtering (HiPIMS) * ionized flux fraction * deposition rate
Obor OECD: Fluids and plasma physics (including surface physics)
Způsob publikování: Open access

We explored the effect of magnetic field strength B and geometry (degree of balancing) on the deposition rate and ionized flux fraction Fflux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) when depositing titanium. The HiPIMS discharge was run in two different operating modes. The first one we refer to as “fixed voltage mode” where the cathode voltage was kept fixed at 625 V while the pulse repetition frequency was varied to achieve the desired time average power (300 W). The second mode we refer to as “fixed peak current mode” and was carried out by adjusting the cathode voltage to maintain a fixed peak discharge current and by varying the frequency to achieve the same average power. Our results show that the dcMS deposition rate was weakly sensitive to variations in the magnetic field while the deposition rate during HiPIMS operated in fixed voltage mode changed from 30% to 90% of the dcMS deposition rate as B decreased.
Trvalý link: http://hdl.handle.net/11104/0304364