In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films

0546089 - FZÚ 2022 RIV US eng J - Článek v odborném periodiku
Novotný, Michal - Fitl, Přemysl - Irimiciuc, S.A. - Bulíř, Jiří - More Chevalier, Joris - Fekete, Ladislav - Hruška, Petr - Chertopalov, Sergii - Vrňata, M. - Lančok, Ján
In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films.
Journal of Applied Physics. Roč. 130, č. 8 (2021), č. článku 085301. ISSN 0021-8979. E-ISSN 1089-7550
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA20-21069S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: silver * thin films * insitu measurement
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 2.877, rok: 2021
Způsob publikování: Omezený přístup
https://doi.org/10.1063/5.0057317

Ultra-thin silver films of thicknesses of the order of 10 nm and less were prepared in different ambient conditions (vacuum, Ar, and N2) by pulsed laser deposition on glass and fused silica substrates. The in situ monitoring of electrical resistance of deposited films and optical emission spectroscopy of plasma were implemented as real-time analysis techniques. Change in the growth mechanism of the Ag layer in N2 ambient is expressed by an acceleration of the coalescence process, which shifts the percolation point toward lower mass thicknesses.The films prepared in vacuum and Ar ambient were found to be unstable for a final resistance in the range from 1 to 100MΩ while the films deposited in N2 revealed stable electrical resistance.

Trvalý link: http://hdl.handle.net/11104/0322679