X-ray/atomic force microscopy study of the temperature-dependent multilayer 
structure of PTCDI-C8 films on SiO2

Krauss, T. N.; Barrena, E.; de Oteyza, D. G.; Zhang, X. N.; Major, J.; Dehm, V.; Würthner, F.; Dosch, H.

doi:10.1021/jp808037w

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X-ray/atomic force microscopy study of the temperature-dependent multilayer structure of PTCDI-C₈ films on SiO₂

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Krauss, T. N.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Barrena, E.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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de Oteyza, D. G.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

Zhang, X. N.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Major, J.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dosch, H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Theoretische und Angewandte Physik, Pfaffenwaldring 57, 70550 Stuttgart, Germany;Institut für Organische Chemie, Am Hubland, Universität Würzburg, 97074 Würzburg, Germany;

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Citation

Krauss, T. N., Barrena, E., de Oteyza, D. G., Zhang, X. N., Major, J., Dehm, V., et al. (2009). X-ray/atomic force microscopy study of the temperature-dependent multilayer structure of PTCDI-C₈ films on SiO₂. Journal of Physical Chemistry C, 113(11), 4502-4506. doi:10.1021/jp808037w.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-75E3-6

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