Studies on Copper Repassivation Characteristics in Basic Solutions Another Step 
towards a “Traditional” CMP

Ein-Eli, Y.; Abelev, E.; Smith, A. J.; Hassel, A. W.

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Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP

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Smith, A. J.
Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Hassel, A. W.
Electrochemistry and Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Ein-Eli, Y., Abelev, E., Smith, A. J., & Hassel, A. W. (2006). Studies on Copper Repassivation Characteristics in Basic Solutions Another Step towards a “Traditional” CMP. Talk presented at 6th International Symposium on Electrochemical Micro & Nanosystem Technologies. Bonn, Germany. 2006-08-22 - 2006-08-25.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0019-5842-C

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