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The origin of reduced chemical erosion of graphite based materials induced by boron doping

MPS-Authors
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Schenk,  A.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Lutterloh,  C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Biener,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

Schubert,  U. A.
Max Planck Society;

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Küppers,  J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schenk, A., Winter, B., Lutterloh, C., Biener, J., Schubert, U. A., & Küppers, J. (1995). The origin of reduced chemical erosion of graphite based materials induced by boron doping. Journal of Nuclear Materials, 220-222, 767-770. doi:10.1016/0022-3115(94)00620-2.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8F11-0
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