Temperature-dependent sputtering of doped graphites and boron carbide

Garcia-Rosales, C.; Gauthier, E.; Roth, J.; Schwörer, R.; Eckstein, W.

doi:10.1016/0022-3115(92)90413-F

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Temperature-dependent sputtering of doped graphites and boron carbide

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Garcia-Rosales, C.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Roth, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwörer, R.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Eckstein, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Garcia-Rosales, C., Gauthier, E., Roth, J., Schwörer, R., & Eckstein, W. (1992). Temperature-dependent sputtering of doped graphites and boron carbide. Journal of Nuclear Materials, 189(1), 1-8. doi:10.1016/0022-3115(92)90413-F.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-94D2-4

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