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http://hdl.handle.net/1903/3378
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| Title: | SENSOR BASED ATOMIC LAYER DEPOSITION FOR RAPID PROCESS LEARNING AND ENHANCED MANUFACURABILITY |
| Authors: | Lei, Wei |
| Advisors: | Rubloff, Gary W |
| Department/Program: | Material Science and Engineering |
| Type: | Dissertation |
| Sponsors: | Digital Repository at the University of Maryland
University of Maryland (College Park, Md.) |
| Keywords: | Engineering, Materials Science (0794)
ALD, QMS, Process Sensing, Tungsten |
| Issue Date: | 16-Mar-2006 |
| Abstract: | In the search for sensor based atomic layer deposition (ALD) process to accelerate process learning and enhance manufacturability, we have explored new reactor designs and applied in-situ process sensing to W and HfO2 ALD processes. A novel wafer scale ALD reactor, which features fast gas switching, good process sensing compatibility and significant similarity to the real manufacturing environment, is constructed. The reactor has a unique movable reactor cap design that allows two possible operation modes: (1) steady-state flow with alternating gas species; or (2) fill-and-pump-out cycling of each gas, accelerating the pump-out by lifting the cap to employ the large chamber volume as ballast. Downstream quadrupole mass spectrometry (QMS) sampling is applied for in-situ process sensing of tungsten ALD process. The QMS reveals essential surface reaction dynamics through real-time signals associated with byproduct generation as well as precursor introduction and depletion for each ALD hal... |
| URI: | http://hdl.handle.net/1903/3378 |
| Appears in Collections: | Materials Science & Engineering Theses and Dissertations
UM Theses and Dissertations
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| umi-umd-3188.pdf | | 1278Kb | Adobe PDF | 237 | View/Open |
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