Artículo

La versión final de este artículo es de uso interno de la institución.
Consulte el artículo en la página del editor
Consulte la política de Acceso Abierto del editor

Abstract:

TiO2 thin films were prepared on glass substrates at different temperatures employing an unfiltered cathodic arc device. The temperature values were varied from room temperature to 400 °C. The crystalline structure of the films was determined by X-ray diffraction. The surface morphology was studied by scanning electron microscopy and atomic force microscopy. Transmittance in UV-visible region was also measured. All films deposited at temperatures lower than 300 °C were amorphous, whereas films obtained at higher temperatures grew in crystalline anatase phase. Phase transition amorphous-to-anatase was observed after post-annealing at 400 °C. The average transmittance value for all films was higher than 80%, a comparison among the films obtained at different temperatures showed a transmittance value slightly higher for films obtained at highest temperatures. Grain size for as-deposited crystalline films was determined approximately in 20 nm, with a surface roughness of about 2 nm. © 2006 Elsevier B.V. All rights reserved.

Registro:

Documento: Artículo
Título:Anatase TiO2 films obtained by cathodic arc deposition
Autor:Kleiman, A.; Márquez, A.; Lamas, D.G.
Filiación:Instituto de Física del Plasma (CONICET), Dpto. de Física, Fac. de Ciencias Exactas y Naturales, Cdad. Universitaria Pab. 1, C1428EHA Buenos Aires, Argentina
Centro de Investigaciones en Sólidos, CITEFA- CONICET, J.B. de La Salle 4397, B1603ALO Villa Martelli Provincia BA, Argentina
Palabras clave:Arc evaporation; Atomic force microscopy (AFM); Structure; Titanium oxide; Deposition; Grain size and shape; Phase transitions; Surface morphology; Surface roughness; Thermal effects; Thin films; Arc evaporation; Cathodic arc deposition; Crystalline structure; Titanium dioxide; Deposition; Grain size and shape; Phase transitions; Surface morphology; Surface roughness; Thermal effects; Thin films; Titanium dioxide
Año:2007
Volumen:201
Número:14
Página de inicio:6358
Página de fin:6362
DOI: http://dx.doi.org/10.1016/j.surfcoat.2006.12.002
Título revista:Surface and Coatings Technology
Título revista abreviado:Surf. Coat. Technol.
ISSN:02578972
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02578972_v201_n14_p6358_Kleiman

Referencias:

  • Diebold, U., (2003) Surf. Sci. Rep., 48, p. 53
  • Watanabe, T., Hashimoto, K., Fujishima, A., (1993) Photocatalytic Purification and Treatment of Water and Air, , Ollis D.F., and Al-Ekabi H. (Eds), Elsevier, Amsterdam
  • Maness, P.C., Smolinski, S., Jacoby, W.A., (1999) Appl. Environ. Microbiol., 65, p. 4094
  • Linsebigler, A.L., Lu, G., Yates, J.T., (1995) Chem. Rev., 95, p. 735
  • Carneiro, J.O., Teixeira, V., Portinha, A., Dupák, L., Magalhães, A., Coutinho, P., (2005) Vacuum, 78, p. 37
  • Fujishima, A., Hashimoto, K., Watanabe, T., (1999) TiO2 Photocatalysis: Fundamentals and Applications, , BKC, Tokyo
  • Zhang, H., Banfield, J.F., (2000) J. Phys. Chem., B, 104, p. 3481
  • Anpo, M., Shima, T., Kodama, S., Kubokawa, Y., (1987) J. Phys. Chem., 91, p. 4305
  • Devi, G.S., Hyodo, T., Shimizu, Y., Egashira, M., (2002) Sens. Actuators, B, 87, p. 122
  • Battiston, G.A., Gerbasi, R., Porchia, M., Marigo, A., (1994) Thin Solid Films, 239, p. 1468
  • Heo, C.H., Lee, S.B., Boo, J.H., (2005) Thin Solid Films, 475, p. 183
  • György, E., Socolo, G., Axente, E., Mihialescu, I.N., Ducu, C., Ciuca, S., (2005) Appl. Surf. Sci., 247, p. 429
  • Zhang, F., Wang, X., Li, C., Wang, H., Chen, L., Liu, X., (1998) Surf. Coat. Technol., 110, p. 136
  • (1995) Handbook of Vacuum Arc Science and Technology, Fundamentals and Applications, , Boxman R.L., Sanders D.M., and Martin P.J. (Eds), Noyes Publ, Park Ridge, New Jersey
  • Bendavid, A., Martin, P.J., Jamting, Å., Takikawa, H., (1999) Thin Solid Films, 355-356, p. 6
  • Leng, Y.X., Chen, J.Y., Sun, H., Yang, P., Wan, G.J., Huang, N., (2004) Surf. Coat. Technol., 176, p. 141
  • Mändl, S., Thorwarth, G., Rauschenbach, B., (2000) Surf. Coat. Technol., 133-134, p. 283
  • Takikawa, H., Matsui, T., Sakakibara, T., Bendavid, A., Martin, P.J., (1999) Thin Solid Films, 348, p. 145
  • Márquez, A., Blanco, G., Fernandez de Rapp, M.E., Lamas, D.G., Tarulla, R., (2004) Surf. Coat. Technol., 187, p. 154
  • Lepone, A., Kelly, H., Márquez, A., (2001) J. Appl. Phys., 90, p. 3174
  • Grondona, D., Márquez, A., Minotti, F., Kelly, H., (2004) J. Appl. Phys., 96, p. 3077
  • Löbl, P., Huppertz, M., Mergel, D., (1994) Thin Solid Films, 251, p. 72
  • Jang, H.R., Kim, S.K., Kim, S.J., (2001) J. Nanopart.Res., 3, p. 141
  • Mardare, D., Hones, P., (1999) Mater. Sci. Eng., B, 68, p. 42
  • Zywitzki, O., Modes, T., Sahm, H., Frach, P., Goedicke, K., Glöß, D., (2004) Surf. Coat. Technol., 180-181, p. 538

Citas:

---------- APA ----------
Kleiman, A., Márquez, A. & Lamas, D.G. (2007) . Anatase TiO2 films obtained by cathodic arc deposition. Surface and Coatings Technology, 201(14), 6358-6362.
http://dx.doi.org/10.1016/j.surfcoat.2006.12.002
---------- CHICAGO ----------
Kleiman, A., Márquez, A., Lamas, D.G. "Anatase TiO2 films obtained by cathodic arc deposition" . Surface and Coatings Technology 201, no. 14 (2007) : 6358-6362.
http://dx.doi.org/10.1016/j.surfcoat.2006.12.002
---------- MLA ----------
Kleiman, A., Márquez, A., Lamas, D.G. "Anatase TiO2 films obtained by cathodic arc deposition" . Surface and Coatings Technology, vol. 201, no. 14, 2007, pp. 6358-6362.
http://dx.doi.org/10.1016/j.surfcoat.2006.12.002
---------- VANCOUVER ----------
Kleiman, A., Márquez, A., Lamas, D.G. Anatase TiO2 films obtained by cathodic arc deposition. Surf. Coat. Technol. 2007;201(14):6358-6362.
http://dx.doi.org/10.1016/j.surfcoat.2006.12.002