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Ion plating with an induction heating sourceInduction heating is introduced as an evaporation heat source in ion plating. A bare induction coil without shielding can be directly used in the glow discharge region with no arcing. The only requirement is to utilize an rf inductive generator with low operating frequency of 75 kHz. Mechanical simplicity of the ion plating apparatus and ease of operation is a great asset for industrial applications; practically any metal such as nickel, iron, and the high temperature refractories can be evaporated and ion plated.
Document ID
19760010307
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Spalvins, T. (NASA Lewis Research Center Cleveland, OH, United States)
Brainard, W. A. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 3, 2013
Publication Date
January 1, 1976
Subject Category
Mechanical Engineering
Report/Patent Number
E-8517
NASA-TM-X-3330
Accession Number
76N17395
Funding Number(s)
PROJECT: RTOP 506-16
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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