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Automated semiconductor diffusion and oxidation facilityA semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived on an air track, automatically loaded into a furnace tube, processed, returned to track, and sent on to the next process. The entire process was controlled by a computer.
Document ID
19820012385
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Date Acquired
September 4, 2013
Publication Date
January 1, 1982
Subject Category
Inorganic And Physical Chemistry
Report/Patent Number
NAS 1.26:161268
NASA-CR-161268
Accession Number
82N20259
Funding Number(s)
CONTRACT_GRANT: NAS8-31612
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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