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Plasma-deposited amorphous hydrogenated carbon films and their tribological propertiesRecent work on the properties of diamondlike carbon films and their dependence on preparation conditions are reviewed. The results of the study indicate that plasma deposition enables one to deposit a variety of amorphous hydrogenated carbon (a-C:H ) films exhibiting more diamondlike behavior to more graphitic behavior. The plasma-deposited a-C:H can be effectively used as hard, wear-resistant, and protective lubricating films on ceramic materials such as Si(sub 3)N(sub 4) under a variety of environmental conditions such as moist air, dry nitrogrn, and vacuum.
Document ID
19900002564
Acquisition Source
Legacy CDMS
Document Type
Preprint (Draft being sent to journal)
Authors
Miyoshi, Kazuhisa
(NASA Lewis Research Center Cleveland, OH, United States)
Pouch, John J.
(NASA Lewis Research Center Cleveland, OH, United States)
Alterovitz, Samuel A.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 6, 2013
Publication Date
October 1, 1989
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA-TM-102379
NAS 1.15:102379
E-5118
Accession Number
90N11880
Funding Number(s)
PROJECT: RTOP 506-43-11
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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