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Fabricating binary optics: An overview of binary optics process technologyA review of binary optics processing technology is presented. Pattern replication techniques have been optimized to generate high-quality efficient microoptics in visible and infrared materials. High resolution optical photolithography and precision alignment is used to fabricate maximally efficient fused silica diffractive microlenses at lambda = 633 nm. The degradation in optical efficiency of four-phase-level fused silica microlenses resulting from an intentional 0.35 micron translational error has been systematically measured as a function of lens speed (F/2 - F/60). Novel processes necessary for high sag refractive IR microoptics arrays, including deep anisotropic Si-etching, planarization of deep topography and multilayer resist techniques, are described. Initial results are presented for monolithic integration of photonic and microoptic systems.
Document ID
19940012870
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Stern, Margaret B.
(Massachusetts Inst. of Tech. Lexington, MA, United States)
Date Acquired
September 6, 2013
Publication Date
August 1, 1993
Publication Information
Publication: NASA. Marshall Space Flight Center, Conference on Binary Optics: An Opportunity for Technical Exchange
Subject Category
Optics
Accession Number
94N17343
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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