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Atmospheric Pressure Method and Apparatus for Removal of Organic Matter with Atomic and Ionic OxygenA gas stream containing ionic and atomic oxygen in inert gas is used to remove organic matter from a substrate. The gas stream is formed by flowing a mixture of gaseous oxygen in an inert gas such as helium at atmospheric pressure past a high voltage, current limited, direct current arc which contacts the gas mixture and forms the ionic and atomic oxygen. The arc is curved at the cathode end and the ionic oxygen formed by the arc nearer to the anode end of the arc is accelerated in a direction towards the cathode by virtue of its charge. The relatively high mass to charge ratio of the ionic oxygen enables at least some of it to escape the arc before contacting the cathode and it is directed onto the substrate. This is useful for cleaning delicate substrates such as fine and historically important paintings and delicate equipment and the like.
Document ID
19980022168
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Banks, Bruce A. (NASA Lewis Research Center Cleveland, OH United States)
Rutledge, Sharon K. (NASA Lewis Research Center Cleveland, OH United States)
Date Acquired
August 17, 2013
Publication Date
December 2, 1997
Subject Category
Inorganic And Physical Chemistry
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-5,693,241|NASA-Case-LEW-20002-1
Patent Application
US-Patent-Appl-SN-687116

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