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Paraelectric gas flow acceleratorA substrate is configured with first and second sets of electrodes, where the second set of electrodes is positioned asymmetrically between the first set of electrodes. When a RF voltage is applied to the electrodes sufficient to generate a discharge plasma (e.g., a one-atmosphere uniform glow discharge plasma) in the gas adjacent to the substrate, the asymmetry in the electrode configuration results in force being applied to the active species in the plasma and in turn to the neutral background gas. Depending on the relative orientation of the electrodes to the gas, the present invention can be used to accelerate or decelerate the gas. The present invention has many potential applications, including increasing or decreasing aerodynamic drag or turbulence, and controlling the flow of active and/or neutral species for such uses as flow separation, altering heat flow, plasma cleaning, sterilization, deposition, etching, or alteration in wettability, printability, and/or adhesion.
Document ID
20080004920
Acquisition Source
Langley Research Center
Document Type
Other - Patent
Authors
Sherman, Daniel M.
Wilkinson, Stephen P.
Roth, J. Reece
Date Acquired
August 24, 2013
Publication Date
March 13, 2001
Subject Category
Instrumentation And Photography
Funding Number(s)
CONTRACT_GRANT: NCC1-223
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,200,539
Patent Application
US-PATENT-APPL-SN-357403

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