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Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective CoatingsIn order to generate advanced multilayer thermal and environmental protection systems, a new deposition process is needed to bridge the gap between conventional plasma spray, which produces relatively thick coatings on the order of 125-250 microns, and conventional vapor phase processes such as electron beam physical vapor deposition (EB-PVD) which are limited by relatively slow deposition rates, high investment costs, and coating material vapor pressure requirements. The use of Plasma Spray - Physical Vapor Deposition (PS-PVD) processing fills this gap and allows thin (< 10 microns) single layers to be deposited and multilayer coatings of less than 100 microns to be generated with the flexibility to tailor microstructures by changing processing conditions. Coatings of yttria-stabilized zirconia (YSZ) were applied to NiCrAlY bond coated superalloy substrates using the PS-PVD coater at NASA Glenn Research Center. A design-of-experiments was used to examine the effects of process variables (Ar/He plasma gas ratio, the total plasma gas flow, and the torch current) on chamber pressure and torch power. Coating thickness, phase and microstructure were evaluated for each set of deposition conditions. Low chamber pressures and high power were shown to increase coating thickness and create columnar-like structures. Likewise, high chamber pressures and low power had lower growth rates, but resulted in flatter, more homogeneous layers
Document ID
20110008752
Acquisition Source
Glenn Research Center
Document Type
Conference Paper
Authors
Harder, Bryan J. (NASA Glenn Research Center Cleveland, OH, United States)
Zhu, Dongming (NASA Glenn Research Center Cleveland, OH, United States)
Date Acquired
August 25, 2013
Publication Date
January 23, 2011
Subject Category
Composite Materials
Report/Patent Number
E-17720
Meeting Information
Meeting: 35th International Conference and Exposition on Advanced Ceramics and Composites
Location: Daytona Beach, FL
Country: United States
Start Date: January 23, 2011
End Date: January 28, 2011
Funding Number(s)
WBS: WBS 984754.02.07.03.16.03
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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