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Fabrication of Advanced Thermoelectric Materials by Hierarchical Nanovoid GenerationA novel method to prepare an advanced thermoelectric material has hierarchical structures embedded with nanometer-sized voids which are key to enhancement of the thermoelectric performance. Solution-based thin film deposition technique enables preparation of stable film of thermoelectric material and void generator (voigen). A subsequent thermal process creates hierarchical nanovoid structure inside the thermoelectric material. Potential application areas of this advanced thermoelectric material with nanovoid structure are commercial applications (electronics cooling), medical and scientific applications (biological analysis device, medical imaging systems), telecommunications, and defense and military applications (night vision equipments).
Document ID
20120000502
Acquisition Source
Langley Research Center
Document Type
Other - Patent
Authors
Choi, Sang Hyouk
Park, Yeonjoon
Chu, Sang-Hyon
Elliott, James R.
King, Glen C.
Kim, Jae-Woo
Lillehei, Peter T.
Stoakley, Diane M.
Date Acquired
August 25, 2013
Publication Date
December 27, 2011
Subject Category
Solid-State Physics
Funding Number(s)
CONTRACT_GRANT: NCC1-02043
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-8,083,986|NASA-Case-LAR-16845-1
Patent Application
US-Patent-Appl-SN-12/315,520
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