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A Study of Micro Craters in Material Samples after Long Duration Exposure on ISS Komplast PanelsThe Komplast materials experiment was designed by the Khrunichev State Research and Production Space Center, together with other Russian scientific institutes, and has been carried out by Mission Control Moscow since 1998. Komplast panels fitted with material samples and sensors were located on the International Space Station (ISS) Functional Cargo Block (FGB) module exterior surface. Within the framework of this experiment, the purpose was to study the effect of the low earth orbit (LEO) environment on exposed samples of various materials. The panels were sent into orbit with the FGB when it launched on November 20, 1998. .
Document ID
20120015647
Acquisition Source
Johnson Space Center
Document Type
Conference Paper
Authors
Shaevich, S. K. (Khrunichev State Research and Production Space Center Moscow, Russian Federation)
Aleksandrov, N. G. (Khrunichev State Research and Production Space Center Moscow, Russian Federation)
Shumov, A. E. (Khrunichev State Research and Production Space Center Moscow, Russian Federation)
Novikov, L. S. (Lomonosov Moscow State Univ. Moscow, Russian Federation)
Chernik, V. N. (Lomonosov Moscow State Univ. Moscow, Russian Federation)
Samokhina, M. S. (Lomonosov Moscow State Univ. Moscow, Russian Federation)
Golden, J. L. (Boeing Co. Houston, TX, United States)
Graves, R. F. (Boeing Co. Houston, TX, United States)
Kravchenko, M. (Boeing Co. Houston, TX, United States)
Christiansen, E. L. (NASA Johnson Space Center Houston, TX, United States)
Henkener, J. A. (NASA Johnson Space Center Houston, TX, United States)
Date Acquired
August 26, 2013
Publication Date
September 24, 2012
Subject Category
Chemistry And Materials (General)
Report/Patent Number
JSC-CN-27073
Meeting Information
Meeting: 12th International Symposium on Materials in the Space Environment
Location: Noordwijk
Country: Netherlands
Start Date: September 24, 2012
End Date: September 28, 2012
Sponsors: European Space Agency
Distribution Limits
Public
Copyright
Public Use Permitted.

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