Gao, B.F.
[Max Planck Institute for Solid State Research]
Gehring, Pascal
[UCL]
Burghard, M.
[Max Planck Institute for Solid State Research]
Kern, K.
[Max Planck Institute for Solid State Research]
We explore the emergence of linear magnetoresistance in thin Bi_2Se_3 sheets upon tuning the carrier density using a back gate. With increasingly negative gate voltage, a pronounced magnetoresistance of ~100% is observed, while the associated B-field dependence changes from quadratic to linear. Concomitantly, the resistance-versus-temperature curves evolve from metallic to semiconductor-like, and increasingly strong weak anti-localization behavior is manifested. Analysis of the magnetoresistance data reveals two contributions, namely from the bulk conduction band and from a state inside the bulk gap. The latter is responsible for the linear magnetoresistance and likely represents the topologically protected surface state.
Bibliographic reference |
Gao, B.F. ; Gehring, Pascal ; Burghard, M. ; Kern, K.. Gate-contolled linear magnetoresistane in thin Bi_2Se_3 sheets. In: Applied Physics Letters, Vol. 100, no.np, p. 4 p. (2012) |
Permanent URL |
http://hdl.handle.net/2078.1/237301 |