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The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited WNxCy films

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Bibliographic reference Hoyas, AM ; Travaly, Y. ; Schuhmacher, J ; Sajavaara, T. ; Whelan, CM ; et. al. The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited WNxCy films. In: Journal of Applied Physics, Vol. 99, no. 6 (2006)
Permanent URL http://hdl.handle.net/2078.1/38565