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Graded Channel concept used to improve RF noise of an industrial 0.15 µm SOI CMOS technology
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| Document type | Communication à un colloque (Conference Paper) – Présentation orale avec comité de sélection |
|---|---|
| Publication date | 2010 |
| Language | Anglais |
| Conference | "The 5th European Microwave Integrated Circuits Conference - EuMIC’10", Paris, France (du 27/09/2010 au 28/09/2010) |
| Peer reviewed | yes |
| Host document | "Proceedings of the 5th European Microwave Integrated Circuits Conference - EuMIC’10" |
| Publication status | Publié |
| Affiliations |
UCL
- SST/ICTM/ELEN - Pôle en ingénierie électrique UCL - SST/ICTM - Institute of Information and Communication Technologies, Electronics and Applied Mathematics |
| Links |
| Bibliographic reference | Emam, Mostafa ; Sakalas, P. ; Kumar, A. ; Ida, J. ; Vanhoenacker-Janvier, Danielle ; et. al. Graded Channel concept used to improve RF noise of an industrial 0.15 µm SOI CMOS technology.The 5th European Microwave Integrated Circuits Conference - EuMIC’10 (Paris, France, du 27/09/2010 au 28/09/2010). In: Proceedings of the 5th European Microwave Integrated Circuits Conference - EuMIC’10, 2010 |
|---|---|
| Permanent URL | http://hdl.handle.net/2078.1/71080 |