User menu

Accès à distance ? S'identifier sur le proxy UCLouvain

Combined in-situ stress and thickness monitoring during electrochemical oxidation of silicon

Bibliographic reference Blaffart, Frédéric ; Santoro, Ronny ; Proost, Joris. Combined in-situ stress and thickness monitoring during electrochemical oxidation of silicon.8th International Conference on Porous Semiconductors-Science and Technology (Malaga, du 25/03/2012 au 30/03/2012). In: Proceedings of the 8th International Conference on Porous Semiconductors-Science and Technology, 2012, p. Abstract O2-03
Permanent URL http://hdl.handle.net/2078/118535