Accès à distance ? S'identifier sur le proxy UCLouvain
Chemical and electrical characterisation of the interaction of BCl3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces
Primary tabs
| Document type | Article de périodique (Journal article) |
|---|---|
| Publication date | 1999 |
| Language | Anglais |
| Journal information | "Journal of The Electrochemical Society" - Vol. 146, no. 11, p. 4230-4235 (1999) |
| Peer reviewed | yes |
| issn | 0013-4651 |
| Publication status | Publié |
| Affiliation | UCL - |
| Links |
| Bibliographic reference | Proost, Joris ; Li, H. ; Conard, T. ; Boullart, W. ; Maex, K.. Chemical and electrical characterisation of the interaction of BCl3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces. In: Journal of The Electrochemical Society, Vol. 146, no. 11, p. 4230-4235 (1999) |
|---|---|
| Permanent URL | http://hdl.handle.net/2078/70720 |