Variable chemical decoration of extended defects in Cu-poor Cu2ZnSnSe4 thin 
films

Schwarz, Torsten; Redinger, Alex; Siebentritt, Susanne; Peng, Zirong; Gault, Baptiste; Raabe, Dierk; Choi, Pyuck-Pa

doi:10.1103/PhysRevMaterials.3.035402

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Variable chemical decoration of extended defects in Cu-poor Cu₂ZnSnSe₄ thin films

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Schwarz, Torsten
Atom Probe Tomography, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Peng, Zirong
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Gault, Baptiste
Atom Probe Tomography, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Raabe, Dierk
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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https://journals.aps.org/prmaterials/abstract/10.1103/PhysRevMaterials.3.035402
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Citation

Schwarz, T., Redinger, A., Siebentritt, S., Peng, Z., Gault, B., Raabe, D., et al. (2019). Variable chemical decoration of extended defects in Cu-poor Cu₂ZnSnSe₄ thin films. Physical Review Materials, 3: 035402. doi:10.1103/PhysRevMaterials.3.035402.

Cite as: https://hdl.handle.net/21.11116/0000-0004-8A8C-3

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