Journal Article

FZJ-2022-00625

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Processing map to control the erosion of Y 2 O 3 in fluorine based etching plasmas

Kindelmann, M. (Corresponding author)FZJ*RWTH* ; Weber, M. L. (ukas) ; Stamminger, M. ; Buschhaus, R. ; Breuer, U.FZJ* ; Bram, M.FZJ* ; Guillon, O.FZJ*

2022
Soc. Westerville, Ohio

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Please use a persistent id in citations: http://hdl.handle.net/2128/31310  doi:10.1111/jace.18334

Abstract: Due to the increasing number of applications for ceramic components in reactive etching processes, the interest in the specific erosion behavior of highly etch-resistant materials like yttrium oxide (Y2O3) has increased in the past years. Despite the large number of investigations already existing in this field, a more general understanding of the erosion mechanisms still lacks due to the limited comparability of these investigations. The huge difference in the kind of etching setups, processing parameters (bias voltage and plasma gas composition), and sample microstructures prevented consistent conclusions so far. To achieve a more general understanding, this study investigates the erosion behavior Y2O3 under a broad spectrum of plasma etching parameters. Therefore, the bias voltage is increased from 50 to 300 V and the plasma gas composition is gradually changed from Ar-rich to CF4-rich compositions. This systematic approach allows to directly correlate the morphology changes caused by plasma erosion with the related plasma etching parameters and enables to better understand their influence on the depth of physical and chemical interactions, surface damage, and etching rate. We discovered three distinct erosion regimes, which exhibit specific erosion characteristics. Using these observations, a schematic processing map for Y2O3 was developed, which could help to estimate the severity of the erosion attack dependent on the processing parameters.

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Contributing Institute(s):

1. Materialwissenschaft u. Werkstofftechnik (ER-C-2)
2. Analytik (ZEA-3)
3. Werkstoffsynthese und Herstellungsverfahren (IEK-1)
4. Elektronische Materialien (PGI-7)
5. JARA-FIT (JARA-FIT)

Research Program(s):

1. 5353 - Understanding the Structural and Functional Behavior of Solid State Systems (POF4-535) (POF4-535)
2. 5233 - Memristive Materials and Devices (POF4-523) (POF4-523)

Appears in the scientific report 2022

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; DEAL Wiley ; Ebsco Academic Search ; Essential Science Indicators ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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