[en] Diffraction grating replication realized by solvent vapor assisted imprinting
lithography (SVAIL) process is here reported. Diffraction efficiency was monitored in real time. The monitoring indicated the variation of diffraction efficiency during the evolution of SVAIL process. According to initial value of monitored diffraction efficiency and to theoretical simulations of diffraction efficiency for various steps of SVAIL process, the value of diffraction efficiency for optimal replication was deduced; and the process could be stopped at that value.
Disciplines :
Physics
Author, co-author :
Horugavye, Georges ; Université de Liège - ULiège > Doct. sc. (physique - Bologne)
Sabushimike, Bernard ; Université de Liège - ULiège > Form. doct. sc. (sc. spatiales - paysage)
Habraken, Serge ; Université de Liège - ULiège > Département de physique > Optique - Hololab
Language :
English
Title :
Control of Solvent Vapor Assisted Imprinting Lithography Process by Real Time Monitoring of Grating Diffraction Efficiency
Publication date :
14 May 2018
Journal title :
International Journal of Nanotechnology and Applications
