Poster (Scientific congresses and symposiums)
Conformal ultra shallow junctions by vapor phase doping with boron
Nguyen, Ngoc Duy; Leys, Frederik; Takeuchi, Shotaro et al.
20084th International SiGe Technology and Device Meeting (ISTDM)
 

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Keywords :
Vapor phase doping; Conformal doping; Ultra shallow junction; FinFET; Boron doping
Disciplines :
Electrical & electronics engineering
Author, co-author :
Nguyen, Ngoc Duy  ;  IMEC
Leys, Frederik;  IMEC
Takeuchi, Shotaro;  IMEC
Loo, Roger;  IMEC
Caymax, Matty;  IMEC
Eyben, Pierre;  IMEC
Vandervorst, Wilfried;  IMEC
Language :
English
Title :
Conformal ultra shallow junctions by vapor phase doping with boron
Publication date :
2008
Event name :
4th International SiGe Technology and Device Meeting (ISTDM)
Event organizer :
Nano Device Laboratories Taiwan
Event place :
Hsinchu, Taiwan
Event date :
11-14/5/2008
Audience :
International
Available on ORBi :
since 12 August 2010

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