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https://hdl.handle.net/2445/32236| Title: | Properties of amorphous silicon thin films grown in square wave modulated silane rf discharges. |
| Author: | Andújar Bella, José Luis Bertrán Serra, Enric Canillas i Biosca, Adolf Campmany i Guillot, Josep, 1966- Serra-Miralles, J. Roch i Cunill, Carles Lloret, A. |
| Keywords: | Semiconductors amorfs Pel·lícules fines Silici Amorphous semiconductors Thin films Silicon |
| Issue Date: | 1992 |
| Publisher: | American Institute of Physics |
| Abstract: | Hydrogenated amorphous silicon (a‐Si:H) thin films have been obtained from pure SiH4 rf discharges by using the square wave modulation (SQWM) method. Film properties have been studied by means of spectroellipsometry, thermal desorption spectrometry, photothermal deflection spectroscopy and electrical conductivity measurements, as a function of the modulation frequency of the rf power amplitude (0.2-4000 Hz). The films deposited at frequencies about 1 kHz show the best structural and optoelectronic characteristics. Based upon the experimental results, a qualitative model is presented, which points up the importance of plasma negative ions in the deposition of a‐Si:H from SQWM rf discharges through their influence on powder particle formation. |
| Note: | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.351229 |
| It is part of: | Journal of Applied Physics, 1992, vol. 71, num. 3, p. 1546-1548 |
| URI: | https://hdl.handle.net/2445/32236 |
| Related resource: | http://dx.doi.org/10.1063/1.351229 |
| ISSN: | 0021-8979 |
| Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| 060160.pdf | 372.89 kB | Adobe PDF | View/Open |
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