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https://hdl.handle.net/10356/83074
Title: | Simultaneous silicon oxide growth and electrophoretic deposition of graphene oxide | Authors: | Fritz, Pina A. Lange, Stefanie C. Giesbers, Marcel Zuilhof, Han Boom, Remko M. Schroën, C. G. P. H. |
Keywords: | Electrophoretic Deposition Graphene Oxide Engineering::Chemical engineering |
Issue Date: | 2019 | Source: | Fritz, P. A., Lange, S. C., Giesbers, M., Zuilhof, H., Boom, R. M., & Schroën, C. G. P. H. (2019). Simultaneous silicon oxide growth and electrophoretic deposition of graphene oxide. Langmuir, 35(10), 3717-3723. doi:10.1021/acs.langmuir.8b03139 | Series/Report no.: | Langmuir | Abstract: | During electrophoretic deposition of graphene oxide (GO) sheets on silicon substrates, not only deposition but also simultaneous anodic oxidation of the silicon substrate takes place, leading to a three-layered material. Scanning electron microscopy images reveal the presence of GO sheets on the silicon substrate, and this is also confirmed by X-ray photoelectron spectroscopy (XPS), albeit that the carbon portion increases with increasing emission angle, hinting at a thin carbon layer. With increasing applied potential and increasing conductivity of the GO solution, the carbon signal decreases, whereas the overall thickness of the added layer formed on top of the silicon substrate increases. Through XPS spectra in which the Si 2p peaks shifted under those conditions to 103–104 eV, we were able to conclude that significant amounts of oxygen are present, indicative of the formation of an oxide layer. This leads us to conclude that GO can be deposited using electrophoretic deposition, but that at the same time, silicon is oxidized, which may overshadow effects previously assigned to GO deposition. | URI: | https://hdl.handle.net/10356/83074 http://hdl.handle.net/10220/49744 |
ISSN: | 0743-7463 | DOI: | 10.1021/acs.langmuir.8b03139 | Schools: | School of Chemical and Biomedical Engineering | Rights: | © 2019 American Chemical Society. This is an open access article published under a Creative Commons Non-Commercial No Derivative Works (CC-BY-NC-ND) Attribution License, which permits copying and redistribution of the article, and creation of adaptations, all for non-commercial purposes. | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | SCBE Journal Articles |
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Simultaneous Silicon Oxide Growth and Electrophoretic Deposition of Graphene Oxide.pdf | 2.46 MB | Adobe PDF | View/Open |
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