One-Step Nanoscale Patterning of Silver Nanowire-Nitride Heterostructures Using Substrate-Assisted Chemical Etching

Elbadawi, C; Fröch, JE; Aharonovich, I; Toth, M; Lobo, CJ

One-Step Nanoscale Patterning of Silver Nanowire-Nitride Heterostructures Using Substrate-Assisted Chemical Etching

Elbadawi, C Fröch, JE

Aharonovich, I

Toth, M

Lobo, CJ

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Publication Type:: Journal Article
Citation:: Journal of Physical Chemistry C, 2019, 123 (1), pp. 945 - 949
Issue Date:: 2019-10-01

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Field	Value	Language
dc.contributor.author	Elbadawi, C	en_US
dc.contributor.author	Fröch, JE https://orcid.org/0000-0003-1111-9704	en_US
dc.contributor.author	Aharonovich, I https://orcid.org/0000-0003-4304-3935	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.contributor.author	Lobo, CJ https://orcid.org/0000-0002-2746-1363	en_US
dc.date.issued	2019-10-01	en_US
dc.identifier.citation	Journal of Physical Chemistry C, 2019, 123 (1), pp. 945 - 949	en_US
dc.identifier.issn	1932-7447	en_US
dc.identifier.uri	http://hdl.handle.net/10453/133961
dc.description.abstract	© 2018 American Chemical Society. Nanoscale etching and patterning of noble metals such as copper, silver, and gold are extremely difficult to achieve due to the low volatility of group 11 metal compounds. Here, we introduce a method of nanoscale chemical etching that involves reactions between H2O adsorbates and N radicals generated from electron-beam-induced etching (EBIE) of a hexagonal boron nitride or AlN substrate to achieve efficient and highly localized chemical etching of Ag nanowires and the underlying substrate. The volatilization of noble metal nanowires by radical species generated during EBIE of the underlying substrate represents a new class of EBIE reactions, which we term "substrate-assisted chemical etching".	en_US
dc.relation	http://purl.org/au-research/grants/arc/LP170100150
dc.relation.ispartof	Journal of Physical Chemistry C	en_US
dc.relation.isbasedon	10.1021/acs.jpcc.8b10645	en_US
dc.subject.classification	Physical Chemistry	en_US
dc.title	One-Step Nanoscale Patterning of Silver Nanowire-Nitride Heterostructures Using Substrate-Assisted Chemical Etching	en_US
dc.type	Journal Article
utslib.citation.volume	1	en_US
utslib.citation.volume	123	en_US
utslib.for	0306 Physical Chemistry (incl. Structural)	en_US
utslib.for	1007 Nanotechnology	en_US
utslib.for	03 Chemical Sciences	en_US
utslib.for	09 Engineering	en_US
utslib.for	10 Technology	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
pubs.organisational-group	/University of Technology Sydney/Students
utslib.copyright.status	closed_access
pubs.issue	1	en_US
pubs.publication-status	Published	en_US
pubs.volume	123	en_US

Abstract:

© 2018 American Chemical Society. Nanoscale etching and patterning of noble metals such as copper, silver, and gold are extremely difficult to achieve due to the low volatility of group 11 metal compounds. Here, we introduce a method of nanoscale chemical etching that involves reactions between H2O adsorbates and N radicals generated from electron-beam-induced etching (EBIE) of a hexagonal boron nitride or AlN substrate to achieve efficient and highly localized chemical etching of Ag nanowires and the underlying substrate. The volatilization of noble metal nanowires by radical species generated during EBIE of the underlying substrate represents a new class of EBIE reactions, which we term "substrate-assisted chemical etching".

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http://hdl.handle.net/10453/133961