- Author
- Title
- Surface-mounted metal-organic frameworks for extreme ultraviolet lithography
- Subtitle
- Exploration of new nanopatterning processes
- Supervisors
- Co-supervisors
- Award date
- 3 June 2021
- Number of pages
- 133
- ISBN
- 9789464232509
- Document type
- PhD thesis
- Faculty
- Faculty of Science (FNWI)
- Institute
- Van 't Hoff Institute for Molecular Sciences (HIMS)
- Abstract
-
Photolithography, the photochemical technique that enables the patterning of nm-scale transistors and circuitry onto semiconductor wafers for the fabrication of computer chips, uses ever shorter wavelengths of light in an effort to continuously downscale transistors dimensions. As a chip’s performance is proportional to its number of transistors, downscaling is a direct way to improve computing power. Extreme ultraviolet (EUV) lithography, the latest development in photolithography, operates at a wavelength of 13.5 nm. At such wavelength, the physicochemical reactions triggered by incoming EUV photons in the photoresist, the light-sensitive material crucial for transferring the patterns onto the substrate, increase in complexity. As EUV-induced chemistry remains missunderstood, the efforts of material scientists to improve photoresist design is hindered which slows down the overall development of photolithography. This thesis aims to broaden the scope of EUV lithography by using metal-organic frameworks, a type of highly versatile advanced materials, to generate µm- to nm-scale patterns onto a substrate. By investigating new materials and methods for EUV lithography, we can provide fresh insights on the technique aiming to improve photoresists or explore its potential beyond chips manufacturing.
- Persistent Identifier
- https://hdl.handle.net/11245.1/fe1cd493-ef3a-4410-9093-5d732cd398a3
- Downloads
-
Thesis (complete)
Front matter
Chapter 1: Introduction
Chapter 2: Copper-based SURMOFs as photoresists for EUV lithography
Chapter 3: Extreme ultraviolet photoelectron spectroscopy on fluorinated monolayers: Towards nanolithography on monolayers
Chapter 4: Bottom-up nanofabrication with extreme ultraviolet light: Metal-organic frameworks on patterned monolayers
Chapter 5: Effect of the linkers’ functionalization on the synthesis of SURMOFs from the DMOF-1(Cu) family
Chapter 6: Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films
Summary; Samenvatting; Outlook; List of publications; Acknowledgements
- Supplementary materials
Disclaimer/Complaints regulations
If you believe that digital publication of certain material infringes any of your rights or (privacy) interests, please let the Library know, stating your reasons. In case of a legitimate complaint, the Library will make the material inaccessible and/or remove it from the website. Please Ask the Library, or send a letter to: Library of the University of Amsterdam, Secretariat, Singel 425, 1012 WP Amsterdam, The Netherlands. You will be contacted as soon as possible.