Dynamic ion behavior in plasma source ion implantation

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2006

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Bozkurt, Bilge

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The aim of this work is to analytically treat the dynamic ion behavior during the evolution of the ion matrix sheath, considering the industrial application plasma source ion implantation for both planar and cylindrical targets, and then to de-velop a code that simulates this dynamic ion behavior numerically. If the sepa-ration between the electrodes in a discharge tube is small, upon the application of a large potential between the electrodes, an ion matrix sheath is formed, which fills the whole inter-electrode space. After a short time, the ion matrix sheath starts moving towards the cathode and disappears there. Two regions are formed as the matrix sheath evolves. The potential profiles of these two regions are derived and the ion flux on the cathode is estimated. Then, by us-ing the finite-differences method, the problem is simulated numerically. It has been seen that the results of both analytical calculations and numerical simula-tions are in a good agreement.

Subject Keywords

Physics.

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http://etd.lib.metu.edu.tr/upload/12607025/index.pdf
https://hdl.handle.net/11511/15669

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Graduate School of Natural and Applied Sciences, Thesis

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Citation Formats

B. Bozkurt, “Dynamic ion behavior in plasma source ion implantation,” M.S. - Master of Science, Middle East Technical University, 2006.