Etching behaviour of alpha-recoil tracks in natural dark mica studied via 
artificial ion tracks.

Lang, M.; Glasmacher, U. A.; Neumann, R.; Wagner, G. A.

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

学術論文

Etching behaviour of alpha-recoil tracks in natural dark mica studied via artificial ion tracks.

MPS-Authors

/persons/resource/persons30747

Lang, M.
Ralf Srama - Heidelberg Dust Group, Research Groups, MPI for Nuclear Physics, Max Planck Society;

/persons/resource/persons30519

Glasmacher, U. A.
Guest Group Archaeometry, MPI for Nuclear Physics, Max Planck Society;

/persons/resource/persons31152

Wagner, G. A.
Guest Group Archaeometry, MPI for Nuclear Physics, Max Planck Society;

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Lang, M., Glasmacher, U. A., Neumann, R., & Wagner, G. A. (2003). Etching behaviour of alpha-recoil tracks in natural dark mica studied via artificial ion tracks. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials & Atoms, 209, 357-361.

引用: https://hdl.handle.net/11858/00-001M-0000-0011-8E5E-9

要旨

要旨はありません