Sputtering Yield of Vapor-Deposited TiC Films by Low Energy Deuterium Ions

Shikama, T.; Bohdansky, J.

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Sputtering Yield of Vapor-Deposited TiC Films by Low Energy Deuterium Ions

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Bohdansky, J.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Shikama, T., & Bohdansky, J. (1988). Sputtering Yield of Vapor-Deposited TiC Films by Low Energy Deuterium Ions. Journal of Nuclear Materials, 152, 2/3, 328-330.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-BE23-5

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