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Elementary Surface Processes during Growth of a-C:H Films

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von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109440

Hopf,  C.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Meier,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger,  T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109489

Jacob,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell, A., Hopf, C., Meier, M., Schwarz-Selinger, T., & Jacob, W. (2003). Elementary Surface Processes during Growth of a-C:H Films. Talk presented at ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces. Avila. 2003-07-22 - 2003-07-25.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002E-943B-C
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