Thermoelastic analysis of a silicon surface under X-ray free-electron-laser irradiation
ARTIGO
Inglês
Agradecimentos: The authors acknowledge financial support from the State of São Paulo Research Agency FAPESP under Grant Nos. 05/56324 and 06/56456. One of the authors (A.R.B.C) benefited from many discussions with Thomas Möller and his group (TU Berlin), which motivated this study, and gratefully...
Agradecimentos: The authors acknowledge financial support from the State of São Paulo Research Agency FAPESP under Grant Nos. 05/56324 and 06/56456. One of the authors (A.R.B.C) benefited from many discussions with Thomas Möller and his group (TU Berlin), which motivated this study, and gratefully acknowledges the kind hospitality received during several visits to TU Berlin
Abstract: We present an analysis of the time evolution of a highly excited silicon substrate after partial absorption of a femtosecond soft x-ray pulse. The detailed time-dependent thermoelastic behavior of the substrate in terms of the displacements u(r,t) is derived for time delays for which the...
Abstract: We present an analysis of the time evolution of a highly excited silicon substrate after partial absorption of a femtosecond soft x-ray pulse. The detailed time-dependent thermoelastic behavior of the substrate in terms of the displacements u(r,t) is derived for time delays for which the usual local thermodynamic variables, temperature T(r,t) and density n(r,t), become well-defined, namely, a few hundred femtoseconds after x-ray pulse absorption. For practical optical components under present conditions of operation with trains of pulses, we find that in a worst case scenario, already the second pulse in the train could be adversely affected by dynamic thermal distortion induced by the preceding pulse
FUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESP
05/56324; 06/56456
Fechado
DOI: https://doi.org/10.1063/1.3455203
Texto completo: https://aip.scitation.org/doi/abs/10.1063/1.3455203
Thermoelastic analysis of a silicon surface under X-ray free-electron-laser irradiation
Thermoelastic analysis of a silicon surface under X-ray free-electron-laser irradiation
Fontes
Review of scientific instruments Vol. 81, n. 7 (July, 2010), n. art. 073102, p. 1-12 |