[en] The physical and chemical aspects of plasma-surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various
plasma diagnostic methods representing the important sputtering discharge regions, namely
the cathode vicinity, plasma bulk, and substrate vicinity, are reported. After a detailed
introduction to the problem and description of the plasma characterization methods suitable
for pulsed magnetron discharge analysis, an overview of the recent plasma diagnostics
achievements in both non-reactive and reactive HiPIMS discharges is presented. Finally, the
conclusions and perspectives suggesting possible directions and research strategies for
increasing our knowledge in this domain are given.
Disciplines :
Architecture Physics
Author, co-author :
Britun, Nikolay ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface
Minea, Tiberiu
Konstantinidis, Stéphanos ; Université de Mons > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface
Snyders, Rony ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface
Language :
English
Title :
Plasma diagnostics for understanding the plasma-surface interaction in HiPIMS discharges: a review
Publication date :
14 May 2014
Journal title :
Journal of Physics: D Applied Physics
ISSN :
0022-3727
Publisher :
Institute of Physics Publishing, Bristol, United Kingdom
Volume :
47
Pages :
224001
Peer reviewed :
Peer Reviewed verified by ORBi
Research unit :
S882 - Chimie des Interactions Plasma-Surface
Research institute :
R400 - Institut de Recherche en Science et Ingénierie des Matériaux
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