Article (Scientific journals)
Positive tone nanoparticle photoresists: New insight on the patterning mechanism
Yu, Mufei; Xu, Hong; Kosma, Vasiliki et al.
2016In Journal of Photopolymer Science and Technology, 29, p. 509-512
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Disciplines :
Chemistry
Author, co-author :
Yu, Mufei
Xu, Hong
Kosma, Vasiliki
Odent, Jérémy  
Kasahara, Kazuki
Giannelis, E.P.
Ober, Christopher K.
Language :
English
Title :
Positive tone nanoparticle photoresists: New insight on the patterning mechanism
Publication date :
11 May 2016
Journal title :
Journal of Photopolymer Science and Technology
ISSN :
0914-9244
Publisher :
Technical Association of Photopolymers, Japan
Volume :
29
Pages :
509-512
Peer reviewed :
Peer Reviewed verified by ORBi
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