Perni S, Shama G, Hobman J L, Lund P A, Kershaw C J, Hidalgo-Arroyo G A, Penn C W, Deng X T, Walsh J L and Kong M G 2007 Appl. Phys. Lett. 90 73902
Kong M G, Kroesen G, Morfill G, Nosenko T, Shimizu T, Van Dijk J and Zimmermann J L 2009 New J. Phys. 11 115012
Yagi I, Shirakawa Y, Hirakata K, Akiyama T, Yonemori S, Mizuno K, Ono R and Oda T 2015 J. Phys. D: Appl. Phys. 48 424006
Nikiforov A, Li L, Britun N, Snyders R, Vanraes P and Leys C 2014 Plasma Sources Sci. Technol. 23 15015
Morfill G E, Shimizu T, Steffes B and Schmidt H-U 2009 New J. Phys. 11 115019
Niemi K, Schulz-von der Gathen V and Döbele H F 2005 Plasma Sources Sci. Technol. 14 375-86
Knake N, Niemi K, Reuter S, Schulz-Von Der Gathen V and Winter J 2008 J. Phys. D: Appl. Phys. 41 194006
Ellerweg D, Benedikt J, Von Keudell A, Knake N and Schulz-Von Der Gathen V 2010 New J. Phys. 12 13021
van Gessel A F H, van Grootel S C and Bruggeman P J 2013 Plasma Sources Sci. Technol. 22 55010
Mozetic M, Ricard A, Babic D, Poberaj I, Levaton J, Monna V and Cvelbar U 2003 J. Vac. Sci. Technol. A 21 369
Moravej M, Yang X, Hicks R F, Penelon J and Babayan S E 2006 J. Appl. Phys. 99 93305
Katsch H M, Tewes A, Quandt E, Goehlich A, Kawetzki T and Dobele H F 2000 J. Appl. Phys. 88 6232
Pagnon D, Amorim J, Nahorny J, Touzeau M and Vialle M 1995 J. Phys. D: Appl. Phys. 28 1856-68
Ellerweg D, von Keudell A and Benedikt J 2012 Plasma Sources Sci. Technol. 21 34019
Reuter S, Winter J, Schmidt-Bleker A, Schroeder D, Lange H, Knake N, Schulz-von der Gathen V and Weltmann K-D 2012 Plasma Sources Sci. Technol. 21 24005
Ono R 2016 J. Phys. D: Appl. Phys. 49 83001
Lu X, Naidis G V, Laroussi M, Reuter S, Graves D B and Ostrikov K 2016 Phys. Rep. 630 1-84
Frank J H and Settersten T B 2005 Proc. Combust. Inst. 30 1527-34
Mazouffre S, Bakker I, Vankan P, Engeln R and Schram D C 2002 Plasma Sources Sci. Technol. 11 439-47
Herring G C, Dyer M J, Jusinski L E and Bischel W K 1988 Opt. Lett. 13 360-2
Ganguly B N and Parish J W 2004 Appl. Phys. Lett. 84 4953-5
Uddi M, Jiang N, Mintusov E, Adamovich I V and Lempert W R 2009 Proc. Combust. Inst. 32 I 929-36
von Woedtke T, Reuter S, Masur K and Weltmann K-D 2013 Phys. Rep. 530 291-320
Li D, Liu D X, Nie Q Y, Li H P, Chen H L and Kong M G 2014 Appl. Phys. Lett. 104 204101
Šimor M, Ráhel' J, Vojtek P, Černák M and Brablec A 2002 Appl. Phys. Lett. 81 2716-8
Shimizu T, Zimmermann J L and Morfill G E 2011 New J. Phys. 13 23026
Jeon J, Klaempfl T G, Zimmermann J L, Morfill G E and Shimizu T 2014 New J. Phys. 16 103007
Li D, Nikiforov A, Britun N, Snyders R, Kong M G and Leys C 2016 J. Phys. D: Appl. Phys. 49 455202
Britun N, Belosludtsev A, Silva T and Snyders R 2017 J. Phys. D: Appl. Phys. 50 075204
Xiong Q, Nikiforov A Y, Britun N, Li L, Snyders R and Lu X P 2016 IEEE Trans. Plasma Sci. 44 2745-53
Niemi K, Schulz-von der Gathen V and Döbele H F 2001 J. Phys. D: Appl. Phys. 34 2330-5
Bittner J, Kohse-honinghaus K, Meier U and Just T 1988 Chem. Phys. Lett. 143 571-6
Bamford D J, Jusinski L E and Bischel W K 1986 Phys. Rev. A 34 185-98
Liu D X, Rong M Z, Wang X H, Iza F, Kong M G and Bruggeman P 2010 Plasma Process. Polym. 7 846-65
Flitti A and Pancheshnyi S V 2009 Eur. Phys. J. Appl. Phys. 45 21001
Dogariu A, Michael J B, Scully M O and Miles R B 2011 Science 331 442-5
Amorim J and Baravian G 2001 Opt. Commun. 192 277-86
Huang Y-L and Gordon R J 1992 J. Chem. Phys. 97 6363
Tonokura K, Shafer N, Matsumi Y and Kawasaki M 1991 J. Chem. Phys. 95 3394
Sato H 2001 Chem. Rev. 101 2687-725
Murakami T, Niemi K, Gans T, O'Connell D and Graham W G 2014 Plasma Sources Sci. Technol. 23 25005
Walsh J L, Liu D X, Iza F, Rong M Z and Kong M G 2010 J. Phys. D: Appl. Phys. 43 32001
Liu D X, Yang A J, Wang X H, Rong M Z, Iza F and Kong M G 2012 J. Phys. D: Appl. Phys. 45 305205
Léveillé V and Coulombe S 2006 Plasma Process. Polym. 3 587-96
Jeong J Y, Park J, Henins I, Babayan S E, Tu V J, Selwyn G S, Ding G and Hicks R F 2000 J. Phys. Chem. A 104 8027-32
Niermann B, Kanitz A, Böke M and Winter J 2011 J. Phys. D: Appl. Phys. 44 325201
Sousa J S, Niemi K, Cox L J, Algwari Q T, Gans T and O'Connell D 2011 J. Appl. Phys. 109 123302
Rahman A, Yalin A P, Surla V, Hoshmiya K, Stan O, Yu Z and Collins G J 2004 Plasma Sources Sci. Technol. 13 537-47
Schneider S, Jarzina F, Lackmann J W, Golda J, Layes V, Schulz-von der Gathen V, Bandow J E and Benedikt J 2015 J. Phys. D: Appl. Phys. 48 444001
Lee L C, Slanger T G, Black G and Sharpless R L 1977 J. Chem. Phys. 67 5602
