Article (Scientific journals)
Competitive and Synergistic Effects Between Excimer VUV Radiation and O Radicals On the Etching Mechanisms of Polyethylene and Fluoropolymer Surfaces Treated by an Atmosphere He-O2 Post-Discharge
Dufour, T.; Hubert, J.; Vandencasteele, Nicolas et al.
2013In Journal of Physics: D Applied Physics, 46, p. 315203
Peer Reviewed verified by ORBi
 

Files


Full Text
cmn616.pdf
Publisher postprint (3.36 MB)
Request a copy

All documents in ORBi UMONS are protected by a user license.

Send to



Details



Disciplines :
Chemistry
Author, co-author :
Dufour, T.
Hubert, J.
Vandencasteele, Nicolas
Viville, Pascal ;  Université de Mons > Unités externes > Materia Nova ASBL
Lazzaroni, Roberto ;  Université de Mons > Faculté des Sciences > Service de Chimie des matériaux nouveaux
Reniers, F.
Language :
English
Title :
Competitive and Synergistic Effects Between Excimer VUV Radiation and O Radicals On the Etching Mechanisms of Polyethylene and Fluoropolymer Surfaces Treated by an Atmosphere He-O2 Post-Discharge
Publication date :
12 July 2013
Journal title :
Journal of Physics: D Applied Physics
ISSN :
0022-3727
Publisher :
Institute of Physics Publishing, Bristol, United Kingdom
Volume :
46
Pages :
315203
Peer reviewed :
Peer Reviewed verified by ORBi
Research unit :
S817 - Chimie des matériaux nouveaux
Research institute :
R400 - Institut de Recherche en Science et Ingénierie des Matériaux
Available on ORBi UMONS :
since 19 August 2013

Statistics


Number of views
0 (0 by UMONS)
Number of downloads
0 (0 by UMONS)

Bibliography


Similar publications



Contact ORBi UMONS