B. Predel, Hf-O, Landolt-Börnstein, New Series Vol. IV/5f (Springer-Verlag, Berlin, 1996).
H. Wang, Y. Wang, J. Zhang, C. Ye, H. B. Wang, J. Weng, B. Y. Wang, Q. Li, and Y. Jiang, Appl. Phys. Lett. APPLAB 0003-6951 93, 202904 (2008). 10.1063/1.3033526
H. Wang, Y. Wang, J. Feng, C. Ye, B. Y. Wang, H. B. Wang, Q. Li, Y. Jiang, A. P. Huang, and Z. S. Xiao, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 93, 681 (2008). 10.1007/s00339-008-4695-8
X. Zhao and D. Vanderbilt, Phys. Rev. B PRBMDO 0163-1829 65, 233106 (2002). 10.1103/PhysRevB.65.233106
G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. JAPIAU 0021-8979 89, 5243 (2001). 10.1063/1.1361065
T. S. Böscke, S. Govindarajan, P. D. Kirsch, P. Y. Hung, C. Krug, B. H. Lee, J. Heitmann, U. Schröder, G. Pant, B. E. Gnade, and W. H. Krautschneider, Appl. Phys. Lett. APPLAB 0003-6951 91, 072902 (2007). 10.1063/1.2771376 (Pubitemid 47283581)
K. Cherkaoui, S. Monaghan, M. A. Negara, M. Modreanu, P. K. Hurley, D. O'Connell, S. McDonnell, G. Hughes, S. Wright, R. C. Barklie, P. Bailey, and T. C. Q. Noakes, J. Appl. Phys. JAPIAU 0021-8979 104, 064113 (2008). 10.1063/1.2978209
L. Feng, Z. Liu, and Y. Shen, Vacuum VACUAV 0042-207X 83, 902 (2009). 10.1016/j.vacuum.2008.08.004
C. T. Kuo, R. Kwor, and K. M. Jones, Thin Solid Films THSFAP 0040-6090 213, 257 (1992). 10.1016/0040-6090(92)90291-I
K. Kita, K. Kyuno, and A. Toriumi, Appl. Phys. Lett. APPLAB 0003-6951 86, 102906 (2005). 10.1063/1.1880436 (Pubitemid 40597121)
P. Liu, C. Tsai, and P. Yang, Appl. Phys. Lett. APPLAB 0003-6951 90, 223101 (2007). 10.1063/1.2743747 (Pubitemid 46872646)
L. Pereira, A. Marques, H. guas, N. Nedev, S. Georgiev, E. Fortunato, and R. Martins, Mater. Sci. Eng., B MSBTEK 0921-5107 109, 89 (2004). 10.1016/j.mseb.2003.10.053
Z. He, W. Wu, H. Xu, J. Zhang, and Y. Tang, Vacuum VACUAV 0042-207X 81, 211 (2006). 10.1016/j.vacuum.2006.02.003 (Pubitemid 44466014)
S. J. Wang, J. W. Chai, Y. F. Dong, Y. P. Feng, N. Sutanto, J. S. Pan, and A. C. H. Huan, Appl. Phys. Lett. APPLAB 0003-6951 88, 192103 (2006). 10.1063/1.2202752 (Pubitemid 43736707)
S. W. Nam, J. Yoo, S. Nam, H. Choi, D. Lee, D. Ko, J. Moon, J. Ku, and S. Choi, J. Non-Cryst. Solids JNCSBJ 0022-3093 303, 139 (2002). 10.1016/S0022-3093(02)00976-6 (Pubitemid 34410837)
W. D. Sproul, M. E. Graham, M. S. Wong, and P. J. Rudnik, Surf. Coat. Technol. SCTEEJ 0257-8972 89, 10 (1997). 10.1016/S0257-8972(96)02913-1
M. Toledano-Luque, E. San Andŕs, A. del Prado, I. Mártil, M. L. Lucía, G. González-Díaz, F. L. Martínez, W. Bohne, J. Röhrich, and E. Strub, J. Appl. Phys. JAPIAU 0021-8979 102, 044106 (2007). 10.1063/1.2769959 (Pubitemid 47352451)
E. Hildebrandt, J. Kurian, J. Zimmermann, A. Fleissner, H. von Seggern, and L. Alff, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 325 (2009). 10.1116/1.3043474
E. Rauwel, C. Dubourdieu, B. Holländer, N. Rochat, F. Ducroquet, M. D. Rossell, G. Van Tendeloo, and B. Pelissier, Appl. Phys. Lett. APPLAB 0003-6951 89, 012902 (2006). 10.1063/1.2216102 (Pubitemid 44025428)
K. Tomida, K. Kita, and A. Toriumi, Appl. Phys. Lett. APPLAB 0003-6951 89, 142902 (2006). 10.1063/1.2355471 (Pubitemid 44522240)
E. V. Stefanovich, A. L. Shluger, and C. R. A. Catlow, Phys. Rev. B PRBMDO 0163-1829 49, 11560 (1994). 10.1103/PhysRevB.49.11560
D. Severin, K. Sarakinos, O. Kappertz, A. Pflug, and M. Wuttig, J. Appl. Phys. JAPIAU 0021-8979 103, 083306 (2008). 10.1063/1.2903492 (Pubitemid 351623522)
International Centre for Diffraction Data 1999 JCPDS Powder Diffraction File No. 81-1550.
D. Severin, O. Kappertz, T. Kubart, T. Nyberg, S. Berg, A. Pflug, M. Simers, and M. Wuttig, Appl. Phys. Lett. APPLAB 0003-6951 88, 161504 (2006). 10.1063/1.2196048
S. Berg and T. Nyberg, Thin Solid Films THSFAP 0040-6090 476, 215 (2005). 10.1016/j.tsf.2004.10.051 (Pubitemid 40259151)
K. Tominaga, D. Ito, and M. Miyamoto, Vacuum VACUAV 0042-207X 80, 654 (2006). 10.1016/j.vacuum.2005.11.007 (Pubitemid 43728694)
S. Mráz and J. M. Schneider, J. Appl. Phys. JAPIAU 0021-8979 100, 023503 (2006). 10.1063/1.2216354 (Pubitemid 44183349)
S. Mráz and J. M. Schneider, Appl. Phys. Lett. APPLAB 0003-6951 89, 051502 (2006). 10.1063/1.2266888 (Pubitemid 44350217)
J. M. Ngaruiya, O. Kappertz, S. H. Mohamed, and M. Wuttig, Appl. Phys. Lett. APPLAB 0003-6951 85, 748 (2004). 10.1063/1.1777412
D. Severin, " Strukturbildung und Prozessstabilisierung beim reaktiven Sputtern.," Ph.D. thesis, RWTH Aachen University, 2006.
V. Kouznetsov, K. Macák, J. M. Schneider, U. Helmersson, and I. Petrov, Surf. Coat. Technol. SCTEEJ 0257-8972 122, 290 (1999). 10.1016/S0257-8972(99)00292-3
U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, Thin Solid Films THSFAP 0040-6090 513, 1 (2006). 10.1016/j.tsf.2006.03.033 (Pubitemid 44202356)
K. Sarakinos, J. Alami, and S. Konstantinidis, Surf. Coat. Technol. SCTEEJ 0257-8972 204, 1661 (2010). 10.1016/j.surfcoat.2009.11.013
E. Wallin and U. Helmersson, Thin Solid Films THSFAP 0040-6090 516, 6398 (2008). 10.1016/j.tsf.2007.08.123
K. Sarakinos, J. Alami, C. Klever, and M. Wuttig, Surf. Coat. Technol. SCTEEJ 0257-8972 202, 5033 (2008). 10.1016/j.surfcoat.2008.05.009
MELEC GmbH, U.S. Patent No. US 6,735,099 B2 (17 April 2001).
J. Alami, K. Sarakinos, G. Mark, and M. Wuttig, Appl. Phys. Lett. APPLAB 0003-6951 89, 154104 (2006). 10.1063/1.2362575 (Pubitemid 44574355)
P. Hohenberg and W. Kohn, Phys. Rev. PRVAAH 0096-8250 136, B864 (1964). 10.1103/PhysRev.136.B864
G. Kresse and J. Hafner, Phys. Rev. B PRBMDO 0163-1829 48, 13115 (1993). 10.1103/PhysRevB.48.13115
G. Kresse and J. Hafner, Phys. Rev. B PRBMDO 0163-1829 49, 14251 (1994). 10.1103/PhysRevB.49.14251
H. J. Monkhorst and J. D. Pack, Phys. Rev. B PRBMDO 0163-1829 13, 5188 (1976). 10.1103/PhysRevB.13.5188
P. E. Blöchl, Phys. Rev. B PRBMDO 0163-1829 50, 17953 (1994). 10.1103/PhysRevB.50.17953
A. Zunger, S. H. Wei, L. G. Ferreira, and J. E. Bernard, Phys. Rev. Lett. PRLTAO 0031-9007 65, 353 (1990). 10.1103/PhysRevLett.65.353
J. M. Cowley, J. Appl. Phys. JAPIAU 0021-8979 21, 24 (1950). 10.1063/1.1699415
I. A. Abrikosov, A. M. N. Niklasson, S. I. Simak, B. Johansson, A. V. Ruban, and H. L. Skriver, Phys. Rev. Lett. PRLTAO 0031-9007 76, 4203 (1996). 10.1103/PhysRevLett.76.4203
I. A. Abrikosov, S. I. Simak, B. Johansson, A. V. Ruban, and H. L. Skriver, Phys. Rev. B PRBMDO 0163-1829 56, 9319 (1997). 10.1103/PhysRevB.56.9319
International Centre for Diffraction Data 1999 JCPDS Powder Diffraction File No. 8-342.
D. Taylor, Br. Ceram. Trans. J. BCTJEH 0266-7606 83, 32 (1984).
J. Wang, X. Zheng, and R. Stevens, J. Mater. Sci. JMTSAS 0022-2461 27, 4348 (1992).
International Centre for Diffraction Data 1999 JCPDS Powder Diffraction File No. 34-104.
J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer, Eden Prairie, 1992).
C. E. Curtis, L. M. Doney, and J. R. Johnson, J. Am. Ceram. Soc. JACTAW 0002-7820 37, 458 (1954). 10.1111/j.1151-2916.1954.tb13977.x
J. Adam and M. D. Rogers, Acta Crystallogr. ABCRE6 0907-4449 12, 951 (1959). 10.1107/S0365110X59002742
D. Severin, O. Kappertz, T. Nyberg, S. Berg, and M. Wuttig, Thin Solid Films THSFAP 0040-6090 515, 3554 (2007). 10.1016/j.tsf.2006.10.130 (Pubitemid 46240204)
S. Miyake, I. Shimizu, R. R. Manory, T. Mori, and G. Kimmel, Surf. Coat. Technol. SCTEEJ 0257-8972 146-147, 237 (2001). 10.1016/S0257-8972(01)01392-5 (Pubitemid 34018611)
Y. Wang, H. Wang, J. Zhang, H. Wang, C. Ye, Y. Yiang, and Q. Wang, Appl. Phys. Lett. APPLAB 0003-6951 95, 032905 (2009). 10.1063/1.3184577
Y. Chen, Y. P. Feng, J. W. Chai, Z. Zhang, J. S. Pan, and S. J. Wang, Appl. Phys. Lett. APPLAB 0003-6951 93, 052104 (2008). 10.1063/1.2969061