Login
EN
[EN] English
[FR] Français
Login
EN
[EN] English
[FR] Français
Explore
Statistics
Help
Start on ORBi
MyORBi
Legal Information
Add your ORCID
Generate a list of publication
About
What's ORBi
Visibility
Release notes
Back
Home
Detailled Reference
Download
Article (Scientific journals)
An atmospheric pressure nonselfsustained glow discharge in between metal/metal and metal/liquid electrodes
Sremacki, Ivana
;
Gromov, Mikhail
;
Leys, Christophe
et al.
2019
•
In
Plasma Processes and Polymers
, p. 1900191
Peer Reviewed verified by ORBi
Permalink
https://hdl.handle.net/20.500.12907/37146
DOI
10.1002/ppap.201900191
Files (1)
Send to
Details
Statistics
Bibliography
Similar publications
Files
Full Text
An_atmospheric_pressure_nonselfsustained_glow_discharge_in_between_metal_metal_and_metal_liquid_electrodes.pdf
Publisher postprint (1.77 MB)
Download
All documents in ORBi UMONS are protected by a
user license
.
Send to
RIS
BibTex
APA
Chicago
Permalink
X
Linkedin
copy to clipboard
copied
Details
Research center :
CIRMAP - Centre d'Innovation et de Recherche en Matériaux Polymères
Disciplines :
Chemistry
Author, co-author :
Sremacki, Ivana
Gromov, Mikhail
;
Université de Mons - UMONS > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface
Leys, Christophe
Morent, Rino
Snyders, Rony
;
Université de Mons > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface
Nikiforov, Anton
Language :
English
Title :
An atmospheric pressure nonselfsustained glow discharge in between metal/metal and metal/liquid electrodes
Publication date :
18 December 2019
Journal title :
Plasma Processes and Polymers
ISSN :
1612-8850
Publisher :
Wiley - VCH Verlag GmbH & Co., Germany
Pages :
e1900191
Peer reviewed :
Peer Reviewed verified by ORBi
Research unit :
S882 - Chimie des Interactions Plasma-Surface
Research institute :
R400 - Institut de Recherche en Science et Ingénierie des Matériaux
Available on ORBi UMONS :
since 16 January 2020
Statistics
Number of views
9 (8 by UMONS)
Number of downloads
18 (0 by UMONS)
More statistics
Scopus citations
®
11
Scopus citations
®
without self-citations
6
OpenCitations
4
Bibliography
A. Fridman, L. A. Kennedy, Plasma Physics and Engineering, CRC Press, New York 2004.
M. A. Lieberman, A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John Wiley & Sons, Hoboken, New Jersey 2005.
G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, A. Fridman, Plasma Process. Polym. 2008, 5, 503.
A. Bogaerts, E. C. Neyts, ACS Energy Lett. 2018, 3, 1013.
A. Anastasopoulou, Q. Wang, V. Hessel, J. Lang, Processes 2014, 2, 694.
N. Cherkasov, A. O. Ibhadon, P. Fitzpatrick, Chem. Eng. Process. Process Intensif. 2015, 90, 24.
W. Wang, B. Patil, S. Heijkers, V. Hessel, A. Bogaerts, ChemSusChem 2017, 10, 2110.
P. J. Bruggeman, F. Iza, R. Brandenburg, Plasma Sources Sci. Technol. 2017, 26.
A. P. Napartovich, Plasmas Polym 2001, 6, 1.
Y. Akishev, M. Grushin, I. Kochetov, V. Karal'Nik, A. Napartovich, N. Trushkin, Plasma Sources Sci. Technol. 2005, 14.
Y. Raizer. Gas Discharge Physics, Springer, Berlin 1991.
Y. Akishev, O. Goossens, T. Callebaut, C. Leys, A. Napartovich, N. Trushkin, J. Phys. D: Appl. Phys. 2001, 34, 2875.
R. H. Stark, K. H. Schoenbach, J. Appl. Phys. 1999, 85, 2075.
F. Leipold, R. H. Stark, A. El-Habachi, K. H. Schoenbach, J. Phys. D: Appl. Phys. 2000, 33, 2268.
R. H. Stark, K. H. Schoenbach, J. Appl. Phys. 2001, 89, 3568.
A. A. H. Mohamed, R. Block, K. H. Schoenbach, IEEE Trans. Plasma Sci. 2002, 30, 182.
K. H. Schoenbach, R. Verhappen, T. Tessnow, F. E. Peterkin, W. W. Byszewski, Appl. Phys. Lett. 1995, 13, 13.
K. H. Schoenbach, A. El-Habachi, M. M. Moselhy, W. Shi, R. H. Stark, Phys. Plasmas 2000, 7, 2186.
W. Shi, R. H. Stark, K. H. Schoenbach, IEEE Trans. Plasma Sci. 1999, 27, 16.
S. Li, J. Medrano Jimenez, V. Hessel, F. Gallucci, Processes 2018, 6, 248.
P. J. Bruggeman, N. Sadeghi, D. C. Schram, V. Linss, Plasma Sources Sci. Technol. 2014, 23, 23001.
J. Voráč, P. Synek, V. Procházka, T. Hoder, J. Phys. D: Appl. Phys. 2017, 50.
J. Voráč, P. Synek, L. Potočňáková, J. Hnilica, V. Kudrle, Plasma Sources Sci. Technol. 2017, 26.
R. B. Miles, W. R. Lempert, J. N. Forkey, Meas. Sci. Technol. 2001, 12, R33.
M. Sneep, W. Ubachs, J. Quant. Spectrosc. Radiat. Transf. 2005, 92, 293.
Y. A. Barinov, V. B. Kaplan, V. V. Rozhdestvenskii, S. M. Shkol'nik, Tech. Phys. Lett. 1998, 24, 929.
D. Staack, B. Farouk, A. Gutsol, A. Fridman, Plasma Sources Sci. Technol. 2008, 17.
H. E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel, J. F. Behnke, User Model. User-Adapt. Interact. 2003, 71, 417.
J. S. Chang, P. A. Lawless, T. Yamamoto, IEEE Trans. Plasma Sci. 1991, 19, 1152.
T. Verreycken, D. C. Schram, C. Leys, P. Bruggeman, Plasma Sources Sci. Technol. 2010, 19.
T. Silva, N. Britun, T. Godfroid, R. Snyders, Plasma Sci. Technol. Prog. Phys. States Chem. React. 2016, 479.
A. Fridman, Y. Yang, Y. I. Cho, Plasma Discharge in Liquid: Water Treatment and Applications, CRC Press, California 2012.
V. V. Rybkin, D. A. Shutov, Plasma Phys. Rep. 2017, 43, 1089.
B. Jiang, J. Zheng, S. Qiu, M. Wu, Q. Zhang, Z. Yan, Q. Xue, Chem. Eng. J. 2014, 236, 348.
A. Lifshitz, J. Chem. Phys. 1974, 61, 2478.
M. Cacciatore, A. Kurnosov, A. Napartovich, J. Chem. Phys. 2005, 123, 174315.
R. J. McNeal, M. E. Whitson Jr, G. R. Cook, J. Geophys. Res. 1974, 79, 1527.
T. Verreycken, A. F. H. van Gessel, A. Pageau, P. Bruggeman, Plasma Sources Sci. Technol. 2011, 20.
J. Zhu, A. Ehn, J. Gao, C. Kong, M. Aldén, M. Salewski, F. Leipold, Y. Kusano, Z. Li, Opt. Express 2017, 25, 20243.
X. Tu, L. Yu, J. H. Yan, K. F. Cen, B. G. Chéron, Phys. Plasmas 2009, 16, 113506.
P. Paris, M. Aints, F. Valk, T. Plank, A. Haljaste, K. V. Kozlov, H. E. Wagner, J. Phys. D: Appl. Phys. 2005, 38, 3894.
S. Pancheshnyi, J. Phys. D: Appl. Phys. 2006, 39, 1708.
P. Paris, M. Aints, F. Valk, T. Plank, A. Haljaste, K. V. Kozlov, H. E. Wagner, J. Phys. D: Appl. Phys. 2006, 39, 2636.
P. Paris, M. Aints, M. Laan, F. Valk, J. Phys. D: Appl. Phys. 2004, 37, 1179.
K. V. Kozlov, H. E. Wagner, R. Brandenburg, P. Michel, J. Phys. D: Appl. Phys. 2001, 34, 3164.
T. Hoder, M. Sira, H.-E. Kozlov, J. Phys. D 2008, 41, 035212.
G. Dilecce, P. F. Ambrico, S. De Benedictis, J. Phys. D: Appl. Phys. 2010, 43.
M. Capitelli, C. M. Ferreira, B. F. Gordiets, A. I. Osipov, Plasma Kinetics in Atmospheric Gases, Springer Science & Business Media, Berlin 2013, 31.
Similar publications
Contact ORBi UMONS